Title Effect of potassium hydrogen phthalate (C8H5KO4) on the one-step electrodeposition of single-phase CuInS2 thin films from acidic solution
Author: Xu, Xinhua; Wang, Feng; Liu, Jingjun & Ji, Jing
Electrochimica Acta, 2010
2010
http://www.sciencedirect.com/science/article/pii/S001346861000352X
More details: The effect of potassium hydrogen phthalate (C8H5KO4) as a special additive on the one-step electrodeposition of single-phase CuInS2 thin films from acidic solution (pH 2.5) was investigated in detail. The XRD, \{SEM\} and UV?��vis?��NIR characterization confirms that the addition of an adequate concentration of \{C8H5KO4\} (23\&\#xa0;mM) to the electrolytic bath containing 12.5\&\#xa0;mM Cu2+, 10\&\#xa0;mM In3+, 40\&\#xa0;mM S2O32?�� and 100\&\#xa0;mM LiCl can contribute greatly to the controllable growth of pure chalcopyrite CuInS2 films with uniform surfaces and an ideal band gap of approximately 1.54\&\#xa0;eV. Complexation studies of \{C8H5KO4\} with Cu2+ and In3+ in electrolytic solutions indicated that \{C8H5KO4\} can complex Cu2+ more strongly than In3+ and move the electrode potentials of Cu2+ and In3+ near each other as determined by polarization analysis. Furthermore, the potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) analysis performed in a series of solution systems revealed a three-step reaction mechanism for CuInS2 deposition and considerable adsorption of C8H5O4?�� and Cu(C8H5O4)+ to the cathode surface. This deposition shows that the synergetic effects of complexation and adsorption originated from the additive on the Cu2+ electro-reduction, thus promoting the co-deposition of copper, indium and sulfur in the form of single-phase CuInS2. Copper indium disulfide,One-step electrodeposition,Reaction mechanism,\{C8H5KO4\} additive
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